School of Physics & Astronomy: UV Nanoimprint Lithography System

The School of Physics and Astronomy requires a UV nanoimprint lithography system with capability to replicate sub-micron scale structures in thin films of commercial photoresits, custom-designed photoresists and organic semiconductors. The system must have capability to align both nanoimprint stamps and photolithography masks to existing features on a sample. The unit must come with toolings for holding both soft stamps for nanoimprint lithography and photomasks for conventional UV photolithography, and sample chucks suitable for a range of sample sizes from 10 mm x 10 mm chips to full wafers.