Pulsed UV laser

The University of Sheffield is out to tender on behalf of the Department of Electronic and Electrical Engineering for components which seek to perform in-situ laser lithography inside a semiconductor reactor. This tender is for a pulsed UV visible laser system to perform the interference lithography. The primary wavelength should be between 300 and 400nm, the pulse width in the 0.5-10ns regime, the pulse energy a minimum of 200mJ and the pulse frequency in the 10 to 25Hz range. Beam quality, stability and divergence are critical aspects for our application and are detailed below in our minimum requirements The University believes the specification may be met using two technologies. However we are open to all options (i) Lamp or diode pumped frequency multiplier Nd/YAG laser (ii) Excimer laser