Dual-growth chamber Molecular Beam Epitaxy System (2 Lots)
Estimated value
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Awarded value
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Suppliers
1
Lots
2
Published
03 Oct 2025
Description
The EPSRC National Epitaxy Facility (NEF) based at the University of Sheffield has been providing bespoke semiconductor wafers to academia and industry for 45 years. It is a unique world-class centre combining technical excellence and expertise with state-of-the-art epitaxy and material characterization equipment. We are looking to further enhance our capability provision to the UK semiconductor community, by investing in a new linked dual-chamber Molecular Beam Epitaxy (MBE) System for arsenides/phosphides and arsenides/antimonides growth that is fully automated, capable of 24/7 operation, reliable, and resource-efficient allowing further expansion in the future.
Scope
- Reference
- 4420/DM/25
- Commercial tool
- Standalone contract
- Main category
- goods
- CPV classifications
- 38000000
- Contract locations
- Yorkshire and the Humber
Award criteria
Criteria the buyer will use to evaluate bids.
| Name | Description | Type | Weighting |
|---|---|---|---|
| Quality & Technical | 80 | quality | — |
| — | 20 | price | — |
| Quality & technical | 80 | quality | — |
| Cost | 20 | cost | — |
Submission & procedure
- Procedure
- Open procedure
Award details
Awarded supplier(s), contract period and value as published in the award notice.
Awarded value
—
Award date
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Contract start
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Contract end
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Lots · 2 total
Divisions of the contract. Each lot can be awarded separately.
| Lot | Title | Est. value | Status |
|---|---|---|---|
| 1 | MBE System | £4.8m | cancelled |
| 2 | In-situ monitoring equipment | £250k | cancelled |